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High mobility two-dimensional hole system in GaAs/AlGaAs quantum wells grown on (100) GaAs substrates

机译:Gaas / alGaas量子阱中的高迁移率二维空穴系统   生长在(100)Gaas衬底上

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摘要

We report on the transport properties of a high mobility two-dimensional holesystem (2DHS) confined in GaAs/AlGaAs quantum wells grown molecular-beamepitaxy on the (100) surface of GaAs. The quantum wells are modulation-dopedwith carbon utilizing a novel resistive filament source. At T=0.3K and carrierdensity p=1x10^11cm^-2, a mobility of 10^6cm^2/Vs is achieved. At fixed carrierdensity p=10^11cm^-2, the mobility is found to be a non-monotonic function ofthe quantum well width. The mobility peaks at 10^6cm^2/Vs for a 15nm well andis reduced for both smaller and larger well widths for these (100) samples. Themobility anisotropy is found to be small. Mobility along (0\bar11) isapproximately 20% higher than along the (011) direction. In addition, the lowtemperature carrier density is found to have low sensitivity to light. The holedensity increases by only ~10% after exposure to red light at T=4.2K. Instructures designed for a lower carrier density of 3.6x10^10cm^-2, a mobilityof 800,000cm^2/Vs is achieved at T=15mK.
机译:我们报告了高迁移率二维空穴系统(2DHS)在GaAs / AlGaAs量子阱中所生长的分子-外延生长在GaAs(100)表面上的传输性质。量子阱利用新型电阻丝源调制掺杂了碳。在T = 0.3K和载流子密度p = 1×10 ^ 11cm ^ -2时,迁移率达到10 ^ 6cm ^ 2 / Vs。在固定的载流子密度p = 10 ^ 11cm ^ -2处,发现迁移率是量子阱宽度的非单调函数。对于这些(100)样品,对于15nm的阱,迁移率在10 ^ 6cm ^ 2 / Vs处达到峰值,并且对于较小和较大的阱宽度都减小。发现迁移率各向异性小。沿(0 \ bar11)的移动性比沿(011)方向的移动性大约高20%。另外,发现低温载流子密度对光的灵敏度低。在T = 4.2K的红光下曝光后,空穴密度仅增加〜10%。为较低的载流子密度3.6x10 ^ 10cm ^ -2设计的结构在T = 15mK时实现了800,000cm ^ 2 / Vs的迁移率。

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